backBack to 3/2016
Technical Issues
3/2016 pp. 53-59

Fotoaktywne powłoki dwutlenku tytanu osadzane reaktywną metodą gas impulse magnetron sputtering (GIMS)

pdf Get full text pdf


Titanium dioxide (TiO2) is one of the most extensively studied metal oxides, also in a form of thin films. It is a polymorphous material known to exist in three crystalline forms, two tetragonal (anatase and rutile) and one orthorhombic (brookite). In the present paper, the way of deposition of thin films of rutile with the help of reactive magnetron sputtering in pure oxygen introduced to the vacuum chamber in the form of short gas pulses is presented. Compared to typical reactive magnetron sputtering, this novel deposition technique, known as gas impulse magnetron sputtering (GIMS), has an advantage of a minimal target poisoning and stechiometric TiO2. Properties of the films deposited on medical grade Ti6Al7Nb alloy were investigated with the use of SEM, EDS, GI-XRD and FTIR. Their photoactivity was determined by the measurements of water and diiodomethane wetting angles after UV light illumination of different duration, varying between 5 and 25 minutes. In addition, the bactericidal activity of the illuminated TiO2 films in contact with E. Coli bacteria was tested using a live-dead test. It has been found that 200-400nm thick stechiometric films of reactive GIMS deposited rutile and anatase are characterised by very fine nanostructure and strong photoactivity.

Key words

TiO2, magnetron sputtering, Gas Impulse Magnetron Sputtering


1. Lobl, P., Huppertz, M., Mergel, D., Nucleation and growth in TiO2 films prepared by sputtering and evaporation, Thin Solid Films, 1994, 251 (1), pp. 72-79.

2. Wiggins, M.D., Nelson, M.C., Aita, C.R., Phase development in sputter deposited titanium dioxide, Vac, J., Sci. Technol. A, 1996, 14 (3) 772.

3. Goswami, D.Y., Trivedi, D.M., Block, S.S., Photocatalytic disinfection of indoor air, J. Sol. Energy Eng., 1997, 119(1), pp. 92–96.

4. Lee, S.H., Pumprueg, S., Moudgil, B., Sigmund, W., Inactivation of bacterial endospores by photocatalytic nanocomposites, Colloids Surf B, Biointerfaces, 2005, 40(2), pp. 93–98.

5. Sekiguchi, Y., Yao, Y., Ohko, Y., Tanaka, K., Ishido, T., Fujishima, A., i inn., Self-sterilizing catheters with titanium dioxide photocatalyst thin films for clean intermittent catheterization: basis and study of clinical use, Int. J. Urol., 2007, 14(5), pp. 426–430.

6. Li, Y., Leung, P., Yao, L., Song, Q.W., Newton, E., Antimicrobial effect of surgical masks coated with nanoparticles, J. Hosp. Infect., 2006, 62(1), pp. 58–63.

7. Szczawiński, J., Tomaszewski., H., Jackowska-Tracz, A., Szczawińska, M.E., Survival of Staphylococcus aureus exposed to UV radiation on the surface of ceramic tiles coated with TiO2, Pol. J. Vet. Sci., 2011, 14(1), pp. 41–46.

8. Tomaszewski, H., Jach, K., Influence of deposition conditions of titania thin films by magnetron sputtering on catalytic, hydrophilic and bactericidal properties of the layers, Ceram. Mater., 2012, 64(1), pp. 1–21.

9. Lundin, D., The HiPIMS Process, Plasma & Coatings Physics Division Department of Physics, Chemistry and Biology Linköping University, Sweden, 2008.

10. Sarakinos, K., Alami, J., Konstantinidis, S., Surf. Coat. Technol., 2010, 204, p.1661.

11. Aiempanakit, M., i inn., Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide, Surface & Coatings Technology, 2011, 205, pp. 4828–4831.

12. Bimal, K., Sarma, i inn., Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering, Materials Chemistry and Physics, 2013, 139, pp. 979-987.

13. Jing, F.J., K. Yukimura, K., i inn., Film characterization of titanium oxide films prepared by high-power impulse magnetron sputtering, Surface & Coatings Technology, 2011, 206, pp. 967–971.

14. Agnarsson, B., i inn., Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering, Thin Solid Films,2013, 545, pp. 445–450.